商標ウォッチ

公開日2025-07-16
公報種別公開国際商標公報
国際登録番号1853510
国際登録日2024-11-27
区分第4類(油脂),第6類(金属),第7類(機械),第9類(機械器具),第11類(環境制御器具),第19類(非金属建材),第35類(広告・事務),第37類(建設),第41類(教育・娯楽),第42類(科学・技術)
商品役務Industrial oils; mineral oils; lubricants.,Flanges of metal (collars); metal flanges (collars), particularly for connecting vacuum components; metal ducts for liquids and gases; metal ducts as vacuum-sealed or non-vacuum-sealed bushings for liquids and gases.,Pumps (machines); vacuum pumps (machines), including gas transfer vacuum pumps, positive displacement pumps, oscillation displacement vacuum pumps, membrane vacuum pumps, piston vacuum pumps, rotary displacement vacuum pumps, rotary vane vacuum pumps, pallet vacuum pumps, rotary piston vacuum pumps, kinetic vacuum pumps, kinetic or mechanical vacuum pumps, turbocharged vacuum pumps, molecular vacuum pumps, turbocharged molecular vacuum pumps 全 123 件を表示, jet pumps, diffusion vacuum pumps, vacuum pumps for binding gases, adsorption vacuum pumps, getter vacuum pumps and cryogenic vacuum pumps; condensing towers being parts of machines; vacuum pump stations primarily consisting of the aforementioned products; machine parts, namely valves, connector elements, separators and filters; automatic handling machines, particularly for mechanically moving components in a chamber, to be operated from outside; automatic mechanical handling machines in which a movement outside the chamber provokes a movement inside the chamber; vacuum chambers being parts of machines, particularly for an installation in a process technology or for process technology adaptation; travel fittings being parts of machines; vacuum chambers equipped with built-in windows being parts of machines; semiconductor processing equipment, in particular for the treatment of vacuum semiconductors; equipment for transporting semiconductors; equipment and systems for semiconductor surface treatment; equipment and systems for etching of semiconductor surfaces; equipment for vapor deposition of semiconductor surfaces, in particular under vacuum (CVD process); equipment for transporting, providing or treating semiconductors; equipment for transporting, treating or providing photoelectric elements; equipment for transporting, treating or providing flat panel displays; machines for ion beam generation; machines for analyzing, deviating and focusing ion beams.,Measuring, regulating, controlling and checking (supervising) apparatus, vacuum measuring apparatus; laboratory apparatus with vacuum chambers for vacuum experimenting, etching and coating; monitoring apparatus; leak detectors; helium leak detectors; leak detectors for identifying leaks in vacuum tanks and in hermetic containers; seal control instruments and seal control systems; leak testers; air-operated leak testers; leak detection apparatus; vacuum leak detectors; leak detectors and detection systems consisting thereof; electric lines; control and measuring instruments in the nature of portholes; vacuum-sealed and non-vacuum sealed cable ducts used as passages for electric lines; vacuum gauges; intercommunication apparatus; measuring devices; gas testing apparatus; computer; electric cells (batteries); computer peripherals; remote-controlled electric apparatus for industrial applications; connections for electric lines; mass spectrometer; solenoid valves (electromagnetic switches); measuring, regulating, monitoring and controlling apparatus for vacuum installations, in particular vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems and vacuum pump stations; automatic vacuum control apparatus; monitoring apparatus; apparatus for measuring, regulating, monitoring and controlling gas intake; data interfaces for vacuum apparatus, particularly vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems; pressure or vibration systems; sensor measurement systems; computer programs for diagnosing vacuum apparatus, particularly vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems; control apparatus for vacuum apparatus, particularly vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems; control apparatus for vacuum apparatus drives, particularly vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems; control apparatus for vacuum pump accessories, namely oil separators, condensate separators, dust separators, coolers, filters, vapor condensers, flanges and control apparatus; control apparatus for valves; control apparatus for mechanical and electric vacuum-sealed bushings, namely current bushings, thermocouple bushings, liquid bushings, tube bushings, rotary bushings; control apparatus for automatic gas inlet valves being parts of machines; regulating apparatus for vacuum apparatus, particularly vacuum pumps, pressure gauges, vacuum gauges, valves, gas flow regulating systems; regulating apparatus for vacuum apparatus drives, particularly vacuum pumps, pressure gauges, vacuum gauges, valves and gas flow regulating systems; regulating apparatus for vacuum pump accessories, namely oil separators, condensate separators, dust separators, coolers, filters, vapor condensers, flanges and control apparatus; regulating devices for valves; regulating devices for vacuum-sealed, mechanical and electric bushings, namely current bushings, thermocouple bushings; regulating devices for automatic gas inlet valves being parts of machines; computer hardware and software for operating installations and equipment for the thermal treatment of surfaces and objects or for thermal processes for surface modification, particularly semiconductor surfaces such as diffusion furnaces, passage furnaces, installations for evaporating semiconductor surfaces, curing furnaces, vacuum furnaces; hardware and software for operating installations and equipment for purifying gases and exhaust gases, including exhaust gas purification installations.,Installations and equipment intended for use in thermal or manufacturing pre-treatment processes, such as diffusion furnaces, continuous furnaces, coating furnaces, curing furnaces, vacuum furnaces, vapor deposition installations, particularly under vacuum (CVD processes); installations for treating and purifying gases and fumes; installations for releasing fumes into the environment.,Non-metallic ducts for liquids and gases; non-metallic ducts being passages sealed or not vacuum sealed for liquids and gases.,Sales promotion for others; negotiating contracts for third parties concerning the purchase and sale of products as well as the provision of services.,Repair, servicing and reconditioning vacuum technique machines and apparatus, machines for producing ion beams, machines for analyzing, deviating and focusing ion beams.,Conducting seminars in the field of vacuum technology.,Calibrating vacuum technique apparatus; technical advice in the field of vacuum technique; scientific and technological services and research in the field of physically charged ion physics.
基礎出願番号
基礎出願日
基礎出願国
出願人Pfeiffer Vacuum GmbH
OCRテキストPFEIFFERテ
OCRテキスト2
OCRについて

関連商標