商標ウォッチ

公開日2025-06-18
公報種別公開国際商標公報
国際登録番号1849146
国際登録日2024-09-25
区分第7類(機械),第9類(機械器具),第37類(建設),第41類(教育・娯楽),第42類(科学・技術)
商品役務Micro-lithography equipment; machines for use in the manufacture by micro-lithography, especially in the manufacture of electronic components, integrated circuits, semi-conductors; universal fixtures and clamping devices used with dimensional measuring apparatus and instruments (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); parts, fittings and components for all the aforesaid goods.,Optical apparatus and instruments; semiconductor lenses; apparatus and software for metrology (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in the manufacture by microlithography, especially of electronic components, semi-conductors, integrated circuits (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electric, electronic and optical apparatus and instruments for use in microlithography (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); software for use in the electronics, micro-lithography, semi-conductor, integrated circuit and integrated optical systems industries; software for the design, testing and fabrication of photo-lithographic masks; semi-conductors; integrated circuits; photo-lithographic masks (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); laser light sources for use in semiconductor manufacturing (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electronic imaging platforms in the field of inspection of semiconductor materials, namely, semiconductor wafers and reticles (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); electron beam inspection apparatus using scanning method; parts, fittings and components for all the aforesaid goods.全 44 件を表示,Maintenance and repair services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries.,Education and training in connection with the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries; education and training in connection with the use of software in the micro-lithography, semiconductor, integrated circuit, magnetic domain memories and integrated optical systems industries; advisory and consultancy services in connection with the aforesaid services.,Technical advisory and consultancy services in connection with machines, apparatus and instruments for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries (term considered too vague by the International Bureau pursuant to Rule 13 (2) (b) of the Regulations); design, maintenance and development of computer software for use in the electronics, micro-lithography, semi-conductor, integrated circuit, magnetic domain memories and integrated optical systems industries and for the design, testing and fabrication of photo-lithographic masks; advisory and consultancy services in connection with the aforesaid services.
基礎出願番号018999521
基礎出願日2024-03-15
基礎出願国EM
出願人Carl Zeiss AG
OCRテキスト
OCRテキスト2ZEISS
OCRについて

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