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公開日2024-10-17
公報種別公開国際商標公報
国際登録番号1805121
国際登録日2024-05-27
区分第1類(化学品)
商品役務Imaging agents for the manufacture of printed circuit boards; imaging agents for semiconductors; photoresist liquid (film) for semiconductor; chemical solvent for removing photoresist and welding agent of circuit board and electronic parts; industrial chemicals; polish removing substances; fluorescent powder; photosensitive dry film for circuit boards (chemical preparation); photosensitizer; imaging agent.
基礎出願番号
基礎出願日
基礎出願国
出願人HUNAN INITIAL NEW MATERIALS CO., LTD.
OCRテキストResoPoWer
OCRテキスト2ResoPower
OCRについて
この商標をJ-PlatPatで参照する

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