TOP特許意匠商標
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公開日2024-03-13
公報種別公開国際商標公報
国際登録番号1770622
国際登録日2023-11-14
区分第1類(化学品)
商品役務Chemicals for use in industry; chemicals for use in plating metals onto various substrates; chemical for use in non-electrolytic nickel-plating; chemicals having a nickel base; metal plating chemical compositions; additives for metal plating solutions; chemical products used in sensitizing compositions, catalysts, accelerators, etchants, etchant neutralizers, nickel compounds and solutions; chemicals for the preparation of photoresists; chemicals used in baths with nickel being used to carry out nickel plating; artificial and synthetic resins; unprocessed plastic materials in powder, liquid or paste form; chemical tempering and soldering preparations; adhesive substances for industrial use.
基礎出願番号98239864
基礎出願日2023-10-25
基礎出願国US
出願人MacDermid Acumen, Inc.
OCRテキストREDUCED ION
OCRテキスト2REDUCEDION
OCRについて
この商標をJ-PlatPatで参照する

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