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公開日2024-04-10
公報種別公開国際商標公報
国際登録番号1774415
国際登録日2023-10-13
区分第1類(化学品)
商品役務Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning.
基礎出願番号97887688
基礎出願日2023-04-13
基礎出願国US
出願人Inpria Corporation
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