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公開日2024-10-02
公報種別公開国際商標公報
国際登録番号1802780
国際登録日2024-03-14
区分第7類(機械),第9類(機械器具)
商品役務Machines for the assembly and packaging of electronic semiconductor chips; machines for manufacturing semiconductors, and structural parts and fittings therefor; semiconductor manufacturing machines; semiconductor manufacturing machines and systems composed of a vacuum chamber for accommodating semiconductor wafers and structural parts and machines for handling and transferring semiconductor wafers into and out of vacuum chamber, and structural parts and fittings therefor; machines for the treatment of semiconductor wafers, namely, semi-conductor wafer processing equipment; industrial robots for the handling of semiconductor wafers; machines for the assembly and packaging of electronic chips; industrial chemical reactors; industrial robots; machines and equipment for the plasma assisted manufacture of semiconductor devices, namely, vacuum treatment machines for plasma assisted deposition, and vacuum machines for depositing fine films; plasma enhanced deposition machines; semiconductor wafer processing equipment, namely, plasma-enhanced deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by plasma-enhanced deposition; reactors for processing semiconductor wafers, namely, industrial chemical reactors for the thermal treatment of semiconductor wafers and industrial chemical reactors for chemical vapor deposition; structural parts and fittings for the aforementioned goods.,Electrical reactors for processing semiconductor wafers; electronic controllers for the semiconductor industry; electronic control systems for semiconductor manufacturing machines; laboratory chemical reactors; robots being electronic control devices, namely, laboratory robots; electronic control systems for machines; structural parts and fittings for the aforementioned goods.
基礎出願番号018998825
基礎出願日2024-03-14
基礎出願国EM
出願人ASM IP Holding B.V.
OCRテキストVALION
OCRテキスト2VALION
OCRについて
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