商標ウォッチ

公開日2024-05-29
公報種別公開国際商標公報
国際登録番号1781428
国際登録日2023-10-25
区分第7類(機械),第9類(機械器具),第11類(環境制御器具),第40類(製造・加工),第42類(科学・技術)
商品役務Machines for semiconductor processing / manufacturing; machines for thin film deposition; semiconductor chip manufacturing equipment; semiconductor wafer processing equipment; semiconductor manufacturing machines, namely, chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors and component parts of CVD, PECVD, ALD or AVD reactors, namely, injection apparatus and instruments for liquid or gaseous substances for the manufacture of semiconductors; machines for the production of semiconductors; robots, vacuum systems, motors and engines, drive units, parts of machines and control mechanisms for operating semiconductor manufacturing machines; control mechanisms for machines for manufacturing semiconductors; injection machines for use in manufacturing semiconductors for injection of liquid or gaseous material and not for medical purposes; apparatus for processing and manufacturing semiconductors or for thin film deposition; industrial cleaning apparatus using air to assist in the cleaning of components in the semiconductor industry; metal organic vapor deposition equipment for use in the manufacture of semiconductors.,Software for use with apparatus, instruments or computers for semiconductor processing or for thin film deposition; semiconductor testing equipment; computer software for use in processing semiconductor wafers; electronic semiconductor control, checking and measuring devices, namely, computer hardware and software for use in measuring 全 49 件を表示, checking and controlling thin film growth or deposition on wafer surfaces and wafer surface temperatures of individual semiconductor wafers; semiconductors; control software for use in operating semiconductor manufacturing machines and installations for chemical vapor deposition (CVD) reactors, plasma-enhanced chemical vapor deposition (PECVD) reactors, atomic layer deposition (ALD) reactors or atomic vapor deposition (AVD) reactors for deposition of thin films onto surfaces; operating system software for use in operating semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces; electronic controllers and measuring devices used with semiconductor manufacturing machines and installations for chemical and/or plasma enhanced vapor deposition of polymers onto surfaces.,Industrial drying apparatus using air for drying components in the semiconductor industry; industrial drying apparatus using air to assist in the cleaning of components in the semiconductor industry.,Processing of semiconductors or deposition of thin films on substrates; consulting services pertaining to the material transformation of the surface of industrial products relating to chemical and/or plasma-enhanced vapor deposition, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces.,Research and development services for semiconductor processing or deposition of thin films on substrates; scientific and technological services, namely, research and design in the field of material transformation of the surface of industrial products relating to chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for CVD, PECVD, ALD and AVD of thin films onto surfaces; industrial research in the field of material transformation of the surface of industrial products relating chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the operation of machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; design and development of computer hardware and software, in particular for operating machines and installations for chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films onto surfaces; technical consulting in the field of new product design and development, namely, in the field of chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films, in particular in relation to the design of machines and installations for chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) or atomic vapor deposition (AVD) of thin films.
基礎出願番号97911161
基礎出願日2023-04-27
基礎出願国US
出願人Eugenus, Inc.
OCRテキストQXP
OCRテキスト2QXP
OCRについて

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